Patent Assignment
Reel/Frame 033360/0510
Change of Address of Assignee
Recorded: 2014-07-18
Pages: 2
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2013-01-01
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 1006606, JAPAN
Covered Property
(1)
Positive Photosensitive Resin Composition, Method of Creating Resist Pattern, and Electronic Component
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 14, 2013
From: TANIMOTO, AKITOSHI; NOBE, SHIGERU; KASUYA, KEI; MATSUTANI, HIROSHI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 029996/0682 →
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →