IP Library › Assignment 030483/0943
Patent Assignment
Reel/Frame 030483/0943

Assignment of Assignor's Interest

Recorded: 2013-05-24 Pages: 6
Assignors
YAMANE, TAKESHI
Executed: 2013-04-05
TERASAWA, TSUNEO
Executed: 2013-02-07
Assignees
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
DAI NIPPON PRINTING CO., LTD.
1-1-1, ICHIGAYA KAGACHO, SHINJUKU-KU, TOKYO, 162-8001, JAPAN
Covered Property (1)
Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device
Patent: 8,986,913 →
Application: 13/840,489 →
Publication: US 2013/0244142
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Demerger Feb 26, 2020
From: KABUSHIKI KAISHA TOSHBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 052022/0344 →
Merger and Change of Name Feb 27, 2020
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051947/0292 →
Change of Name Feb 28, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 053443/0491 →