IP Library › Assignment 053443/0491
Patent Assignment
Reel/Frame 053443/0491

Change of Name

Recorded: 2020-02-28 Pages: 100
Assignor
TOSHIBA MEMORY CORPORATION
Executed: 2019-10-01
Assignee
KIOXIA CORPORATION
1-21, SHIBAURA 3-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties (2)
Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device
Patent: 8,986,913 →
Application: 13/840,489 →
Publication: US 2013/0244142
Optimum Imaging Position Detecting Method, Optimum Imaging Position Detecting Device, Photomask Manufacturing Method, and Semiconductor Device Manufacturing Method
Patent: 8,912,501 →
Application: 13/841,049 →
Publication: US 2013/0244143
Related Assignments (4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest May 24, 2013
From: YAMANE, TAKESHI; TERASAWA, TSUNEO
To: KABUSHIKI KAISHA TOSHIBA; DAI NIPPON PRINTING CO., LTD.
Reel/Frame 030483/0943 →
Assignment of Assignor's Interest May 24, 2013
From: YAMANE, TAKESHI; TERASAWA, TSUNEO
To: KABUSHIKI KAISHA TOSHIBA; DAI NIPPON PRINTING CO., LTD.
Reel/Frame 030483/0990 →
Demerger Feb 26, 2020
From: KABUSHIKI KAISHA TOSHBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 052022/0344 →
Merger and Change of Name Feb 27, 2020
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051947/0292 →