Patent Assignment
Reel/Frame 052022/0344
Demerger
Recorded: 2020-02-26
Pages: 3
Assignor
KABUSHIKI KAISHA TOSHBA
Executed: 2017-04-01
Assignee
TOSHIBA MEMORY CORPORATION
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(2)
Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device
Optimum Imaging Position Detecting Method, Optimum Imaging Position Detecting Device, Photomask Manufacturing Method, and Semiconductor Device Manufacturing Method
Related Assignments
(4)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
May 24, 2013
From: YAMANE, TAKESHI; TERASAWA, TSUNEO
To: KABUSHIKI KAISHA TOSHIBA; DAI NIPPON PRINTING CO., LTD.
Reel/Frame 030483/0943 →
Assignment of Assignor's Interest
May 24, 2013
From: YAMANE, TAKESHI; TERASAWA, TSUNEO
To: KABUSHIKI KAISHA TOSHIBA; DAI NIPPON PRINTING CO., LTD.
Reel/Frame 030483/0990 →
Merger and Change of Name
Feb 27, 2020
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 051947/0292 →
Change of Name
Feb 28, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 053443/0491 →