Patent Assignment
Reel/Frame 031874/0054
Assignment of Assignor's Interest
Recorded: 2014-01-02
Pages: 3
Assignor
TAKAHATA, MASAHIRO
Executed: 2013-12-19
Assignee
JX NIPPON MINING & METALS CORPORATION
6-3, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8164, JAPAN
Covered Property
(1)
High-Purity Yttrium, Process of Producing High-Purity Yttrium, High-Purity Yttrium Sputtering Target, Metal Gate Film Deposited with High-Purity Yttrium Sputtering Target, and Semiconductor Element and Device Equipped with the Metal Gate Film
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.