Patent Assignment
Reel/Frame 032297/0554
Assignment of Assignor's Interest
Recorded: 2014-02-25
Pages: 4
Assignors
SATOH, KIMIHIRO
Executed: 2014-01-09
JUNG, DONG HA
Executed: 2014-01-09
ZHANG, JING
Executed: 2014-01-09
CHEN, BENJAMIN
Executed: 2014-01-09
HUAI, YIMING
Executed: 2014-01-09
RANJAN, RAJIV YADAV
Executed: 2014-01-09
ZHOU, YUCHEN
Executed: 2014-01-09
Assignee
AVALANCHE TECHNOLOGY INC.
46600 LANDING PARKWAY, FREMONT, CALIFORNIA, 94538
Covered Property
(1)
Mtj Stack and Bottom Electrode Patterning Process with Ion Beam Etching Using a Single Mask
Related Assignments
(6)
Other recorded transfers of the patent in this record — the chain of ownership.
Security Interest
Apr 18, 2017
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 042273/0813 →
Security Interest
Feb 13, 2020
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 051930/0396 →
Security Interest
Jul 8, 2020
From: AVALANCHE TECHNOLOGY, INC.
To: SILICON VALLEY BANK
Reel/Frame 053156/0223 →
Security Interest
Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057213/0050 →
Security Interest
Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057217/0674 →
Security Interest
Mar 18, 2022
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 059436/0203 →