Patent Assignment
Reel/Frame 033931/0748
Assignment of Assignor's Interest
Recorded: 2014-10-10
Pages: 3
Assignee
JX NIPPON MINING & METALS CORPORATION
6-3, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8164, JAPAN
Covered Property
(1)
Tantalum Sputtering Target, Method for Manufacturing Same, and Barrier Film for Semiconductor Wiring Formed by Using Target
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.