IP Library Assignment 034604/0797
Patent Assignment
Reel/Frame 034604/0797

Assignment of Assignor's Interest

Recorded: 2014-12-31 Pages: 3
Assignor
LI, ZHANXIN
Executed: 2014-12-31
Assignee
CSMC TECHNOLOGIES FAB1 CO., LTD.
NO. 8 XINZHOU ROAD, NEW DISTRICT WUXI, JIANGSU, 214028, CHINA
Covered Property (1)
Method for Manufacturing a Silicon Nitride Thin Film Using Plasma-Enhanced Chemical Vapor Deposition
Patent: 9,431,241 →
Application: 14/411,999 →
Publication: US 2015/0179437
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Jun 12, 2019
From: CSMC TECHNOLOGIES FAB1 CO., LTD.
To: CSMC TECHNOLOGIES FAB2 CO., LTD.
Reel/Frame 049450/0142 →