Patent Assignment
Reel/Frame 049450/0142
Merger
Recorded: 2019-06-12
Pages: 5
Assignor
CSMC TECHNOLOGIES FAB1 CO., LTD.
Executed: 2017-08-31
Assignee
CSMC TECHNOLOGIES FAB2 CO., LTD.
NO. 8 XINZHOU ROAD, WUXI NEW DISTRICT, JIANGSU, 214028, CHINA
Covered Properties
(6)
Compatible Vertical Double Diffused Metal Oxide Semiconductor Transistor and Lateral Double Diffused Metal Oxide Semiconductor Transistor and Manufacture Method Thereof
Electrostatic Discharge Protection Structure And Fabrication Method Thereof
Power MOS Device Structure
Method for Removing Polysilicon Protection Layer on a Back Face of an Igbt Having a Field Stop Structure
Method for Manufacturing a Silicon Nitride Thin Film Using Plasma-Enhanced Chemical Vapor Deposition
Electrostatic Discharge Protection Structure and Fabrication Method Thereof
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 13, 2012
From: GUI, LINCHUN; WANG, LE; ZHAO, ZHIYONG; HE, LILI
To: CSMC TECHNOLOGIES FAB1 CO., LTD.; CSMC TECHNOLOGIES FAB2 CO., LTD.
Reel/Frame 027529/0863 →
Assignment of Assignor's Interest
Dec 31, 2013
From: HU, YONGHAI; DAI, MENG; LIN, ZHONGYU; WANG, GUANGYANG
To: CSMC TECHNOLOGIES FAB1 CO., LTD.
Reel/Frame 031864/0503 →
Assignment of Assignor's Interest
Dec 31, 2013
From: ZHANG, SHU; HE, YANQIANG; LO, TSEHUANG; WU, HSIAOCHIA
To: CSMC TECHNOLOGIES FAB1 CO., LTD.
Reel/Frame 031864/0533 →
Assignment of Assignor's Interest
Dec 30, 2014
From: RUI, QIANG; ZHANG, SHUO; WANT, GENYI; DENG, XIAOSHE
To: CMSC TECHNOLOGIES FAB1 CO., LTD.
Reel/Frame 034599/0454 →
Assignment of Assignor's Interest
Dec 31, 2014
From: LI, ZHANXIN
To: CSMC TECHNOLOGIES FAB1 CO., LTD.
Reel/Frame 034604/0797 →