IP Library Assignment 037164/0207
Patent Assignment
Reel/Frame 037164/0207

Assignment of Assignor's Interest

Recorded: 2015-11-30 Pages: 6
Assignors
WANG, HONGYU
Executed: 2014-07-29
COOK, LEE MELBOURNE
Executed: 2014-07-28
WANG, JIUN-FANG
Executed: 2014-07-30
CHAO, CHING-HSUN
Executed: 2014-07-30
Assignee
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
451 BELLEVUE ROAD, NEWARK, DELAWARE, 19713
Covered Property (1)
Method for Chemical Mechanical Polishing Substrates Containing Ruthenium and Copper
Patent: 9,299,585 →
Application: 14/444,382 →
Publication: US 2016/0027663
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Oct 29, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC.
To: DUPONT ELECTRONIC MATERIALS HOLDING, INC.
Reel/Frame 069274/0160 →
Security Interest Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073515/0243 →
Security Interest Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 073517/0298 →