IP Library Assignment 039499/0786
Patent Assignment
Reel/Frame 039499/0786

Assignment of Assignor's Interest

Recorded: 2016-08-22 Pages: 4
Assignors
EBIHARA, MASAHIKO
Executed: 2016-04-07
OOTA, EMIKO
Executed: 2016-04-07
MURAKAMI, YASUHARU
Executed: 2016-04-07
YAMAZAKI, HIROSHI
Executed: 2016-04-15
TANAKA, HIROYUKI
Executed: 2016-04-07
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Photosensitive Conductive Film, Conductive Pattern Formation Method Using Same, and Conductive Pattern Substrate
Application: 15/026,764 →
Publication: US 2016/0238942
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →