IP Library › Assignment 040329/0950
Patent Assignment
Reel/Frame 040329/0950

Assignment of Assignor's Interest

Recorded: 2016-11-15 Pages: 10
Assignor
MICRON TECHNOLOGY, INC.
Executed: 2009-07-08
Assignee
APTINA IMAGING CORPORATION
C/O CITICO TRUSTEES (CAYMAN) LIMITED, REGATTA OFFICE PARK, WEST BAY ROAD, GRAND CAYMAN, Y1-1205, CAYMAN ISLANDS
Covered Properties (4)
Masked Spacer Etching for Imagers
Patent: 7,211,848 →
Application: 10/921,274 →
Publication: US 2005/0059180
Optimized Photodiode Process for Improved Transfer Gate Leakage
Patent: 7,749,798 →
Application: 11/094,363 →
Publication: US 2005/0167708
Masked Spacer Etching for Imagers
Patent: 7,355,229 →
Application: 11/476,759 →
Publication: US 2006/0243981
High Intrascene Dynamic Range Ntsc and Pal Imager
Patent: 7,973,842 →
Application: 12/081,302 →
Publication: US 2008/0218621
Related Assignments (3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 15, 2016
From: CHO, KWANG-BO; SUBBOTIN, IGOR; KAPLINSKY, MICHAEL; BARNA, SANDOR L.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 040329/0435 →
Assignment of Assignor's Interest Nov 15, 2016
From: RHODES, HOWARD E.; MAURITZSON, RICHARD A.; PATRICK, INNA
To: MICRON TECHNOLOGY, INC.
Reel/Frame 040329/0641 →
Assignment of Assignor's Interest Nov 15, 2016
From: RHODES, HOWARD E.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 040329/0824 →