IP Library Assignment 041435/0965
Patent Assignment
Reel/Frame 041435/0965

Assignment of Assignor's Interest

Recorded: 2017-03-02 Pages: 2
Assignors
IKEDA, NORIHIKO
Executed: 2016-12-13
YASUI, NAOKI
Executed: 2016-12-13
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Application: 15/445,027 →
Publication: US 2018/0082821
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →