IP Library › Assignment 041438/0533
Patent Assignment
Reel/Frame 041438/0533

Assignment of Assignor's Interest

Recorded: 2017-03-02 Pages: 2
Assignors
ASAKURA, RYOJI
Executed: 2016-12-20
SHIRAISHI, DAISUKE
Executed: 2016-12-26
KAGOSHIMA, AKIRA
Executed: 2016-12-26
INOUE, SATOMI
Executed: 2016-12-26
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Analysis Method for Analyzing Plasma Processing Data
Application: 15/445,203 →
Publication: US 2018/0025894
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →