Patent Assignment
Reel/Frame 042818/0877
Assignment of Assignor's Interest
Recorded: 2017-06-26
Pages: 2
Assignors
NAGOSHI, TOSHIMASA
Executed: 2016-11-08
TANAKA, SHIGEO
Executed: 2016-11-08
FUKUZUMI, SHIZU
Executed: 2016-11-10
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Photosensitive Element, Laminate, Permanent Mask Resist, Method for Producing Same, and Method for Producing Semiconductor Package
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Jun 2, 2021
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 056449/0652 →
Change of Name
Mar 8, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062992/0805 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →