IP Library Assignment 056449/0652
Patent Assignment
Reel/Frame 056449/0652

Change of Name

Recorded: 2021-06-02 Pages: 52
Assignor
HITACHI CHEMICAL COMPANY, LTD.
Executed: 2020-10-01
Assignee
SHOWA DENKO MATERIALS CO., LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Photosensitive Element, Laminate, Permanent Mask Resist, Method for Producing Same, and Method for Producing Semiconductor Package
Application: 15/306,408 →
Publication: US 2017/0045817
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jun 26, 2017
From: NAGOSHI, TOSHIMASA; TANAKA, SHIGEO; FUKUZUMI, SHIZU
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 042818/0877 →
Change of Name Mar 8, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062992/0805 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →