IP Library Assignment 045146/0160
Patent Assignment
Reel/Frame 045146/0160

Assignment of Assignor's Interest

Recorded: 2018-03-08 Pages: 3
Assignors
ASAKURA, RYOJI
Executed: 2017-12-18
UMEDA, SHOTA
Executed: 2017-12-11
SHIRAISHI, DAISUKE
Executed: 2017-12-05
KAGOSHIMA, AKIRA
Executed: 2017-12-05
INOUE, SATOMI
Executed: 2017-12-05
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing System
Application: 15/892,041 →
Publication: US 2019/0051502
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 25, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052225/0894 →