Patent Assignment
Reel/Frame 048545/0448
Assignment of Assignor's Interest
Recorded: 2019-03-08
Pages: 3
Assignors
XU, HAO
Executed: 2018-12-27
UCHIDA, HIROSHIGE
Executed: 2018-12-27
NAKAMOTO, SHIGERU
Executed: 2018-12-28
FUKUCHI, KOUSUKE
Executed: 2018-12-28
INOUE, SATOMI
Executed: 2018-12-28
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Plasma Processing Method
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.