Patent Assignment
Reel/Frame 048546/0223
Assignment of Assignor's Interest
Recorded: 2019-03-08
Pages: 3
Assignors
MIYOSHI, NOBUYA
Executed: 2019-01-24
KOBAYASHI, HIROYUKI
Executed: 2019-01-25
SHINODA, KAZUNORI
Executed: 2019-01-24
KAWAMURA, KOHEI
Executed: 2019-01-25
OOKUMA, KAZUMASA
Executed: 2019-01-28
KOUZUMA, YUTAKA
Executed: 2019-01-25
IZAWA, MASARU
Executed: 2019-01-28
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Etching Method and Plasma Etching Apparatus
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.