Patent Assignment
Reel/Frame 048673/0487
Assignment of Assignor's Interest
Recorded: 2019-03-22
Pages: 2
Assignors
UEDA, KAZUHIRO
Executed: 2018-12-14
IKENAGA, KAZUYUKI
Executed: 2018-12-14
TAMURA, TOMOYUKI
Executed: 2018-12-14
SUMIYA, MASAHIRO
Executed: 2018-12-14
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Member of Plasma Processing Chamber
Application:
16/357,971 →
Publication:
US 2019/0326101
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.