IP Library Assignment 052086/0012
Patent Assignment
Reel/Frame 052086/0012

Assignment of Assignor's Interest

Recorded: 2020-03-11 Pages: 7
Assignors
SHINODA, KAZUNORI
Executed: 2020-02-20
OTAKE, HIROTO
Executed: 2020-02-20
KOBAYASHI, HIROYUKI
Executed: 2020-02-20
KAWAMURA, KOHEI
Executed: 2020-02-20
IZAWA, MASARU
Executed: 2020-02-20
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method and Etching Apparatus
Application: 16/646,057 →
Publication: US 2021/0242030
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Aug 10, 2021
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 057132/0895 →