IP Library › Assignment 057132/0895
Patent Assignment
Reel/Frame 057132/0895

Change of Name

Recorded: 2021-08-10 Pages: 4
Assignor
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method and Etching Apparatus
Application: 16/646,057 →
Publication: US 2021/0242030
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 11, 2020
From: SHINODA, KAZUNORI; OTAKE, HIROTO; KOBAYASHI, HIROYUKI; KAWAMURA, KOHEI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 052086/0012 →