IP Library Assignment 053013/0743
Patent Assignment
Reel/Frame 053013/0743

Assignment of Assignor's Interest

Recorded: 2020-06-23 Pages: 3
Assignors
MINAMI, HISATAKA
Executed: 2016-02-15
IWANO, TOMOHIRO
Executed: 2016-02-17
ARAKAWA, KEITA
Executed: 2016-02-15
HIDAKA, TAKAHIRO
Executed: 2016-02-15
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Slurry, Polishing-Liquid Set, Polishing Liquid, and Polishing Method for Base
Application: 16/908,884 →
Publication: US 2020/0325360
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Nov 8, 2022
From: HITACHI CHEMICAL CO., LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 061898/0648 →
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →