IP Library Assignment 054979/0924
Patent Assignment
Reel/Frame 054979/0924

Change of Name

Recorded: 2021-01-13 Pages: 11
Assignor
NIHON CABOT MICROELECTRONICS K.K.
Executed: 2020-10-28
Assignee
CMC MATERIALS KK
1287-19 KITAKOYAMA, GEINO-CHO, TSU-SHI, MIE, 514-2213, JAPAN
Covered Property (1)
Chemical-Mechanical Polishing Composition, Rinse Composition, Chemical-Mechanical Polishing Method, and Rinsing Method
Application: 17/260,106 →
Publication: US 2021/0284868
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 13, 2021
From: MASUDA, TSUYOSHI; KITAMURA, HIROSHI; MATSUMURA, YOSHIYUKI; NAMIKI, AKIHISA
To: NIHON CABOT MICROELECTRONICS K.K.
Reel/Frame 054908/0197 →
Security Interest Jul 8, 2022
From: CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 060615/0001 →
Merger Nov 28, 2023
From: CMC MATERIALS KK
To: ENTEGRIS JAPAN CO., LTD.
Reel/Frame 065686/0902 →
Assignment of Assignor's Interest Dec 4, 2023
From: ENTEGRIS JAPAN CO., LTD.
To: ENTEGRIS, INC.
Reel/Frame 065746/0789 →