IP Library Granted Patent US 11,384,257
Granted Patent B2
US 11,384,257 · App. 17/260,106 · Granted Jul 12, 2022

Chemical-mechanical polishing composition, rinse composition, chemical-mechanical polishing method, and rinsing method

Inventors: Tsuyoshi Masuda (Tsu-shi, JP); Hiroshi Kitamura (Tsu-shi, JP); Yoshiyuki Matsumura (Kashihara, JP); Akihisa Namiki (Tsu-shi, JP)
C09G1/02C11D1/72H01L21/30625
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Quick Facts
Patent No.
US 11,384,257
App. No.
17/260,106
Granted
Jul 12, 2022
Kind
B2
Abstract

Provided is a chemical-mechanical polishing composition including an abrasive, a basic component, a polyoxyalkylene alkyl ether represented by the formula (i) RO-(AO) n —H, wherein R is a linear or branched C 1 to C 15 alkyl group, A is an alkylene group selected from the group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents average addition mol numbers of AO and is 2 to 30, and an aqueous carrier, a rinse composition including the polyoxyalkylene alkyl ether and an aqueous carrier, and a substrate chemical-mechanical polishing method and a rinsing method in which these are used.

Claims (37)

1. A chemical mechanical polishing composition comprising:

a polishing agent;

a basic component;

a polyoxyalkylene alkyl ether represented by Formula (i) RO-(AO) n —H, where R represents a linear or branched C 11 -C 15 alkyl group, A represents an alkylene group selected from a group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents the average number of moles of added AO groups, the number being from 6 to 30; and

an aqueous carrier.

2. A chemical-mechanical polishing composition according to claim 1 , further comprising a water-soluble polymer other than the polyoxyalkylene alkyl ether.

3. A chemical mechanical polishing composition according to claim 2 , wherein the water-soluble polymer includes at least one type selected from a group consisting of a cellulose derivative, a polymer containing a polyvinyl alcohol structural unit, an alkylene polyalkylene oxide amine polymer including at least two repeating structural units having a tertiary amine with an alkylene group and a polyalkylene oxide group bonded to an N atom, and any combination thereof.

4. A chemical mechanical polishing composition according to claim 3 , wherein the water-soluble polymer includes a cellulose derivative, a polymer containing a polyvinyl alcohol structural unit, and an alkylene polyalkylene oxide amine polymer including at least two repeating structural units having a tertiary amine with an alkylene group and a polyalkylene oxide group bonded to an N atom.

5. A chemical mechanical polishing composition according to claim 3 , wherein the water-soluble polymer is a polymer containing a polyvinyl alcohol structural unit.

6. A chemical mechanical polishing composition comprising:

a polishing agent;

a basic component;

a polyoxyalkylene alkyl ether including at least one of polyoxyethylene oxypropylene 2-propyl heptyl ether and polyoxyethylene isotridecyl ether;

further comprising a water-soluble polymer other than the polyoxyalkylene alkyl ether; and

an aqueous carrier.

7. A chemical mechanical polishing composition comprising:

a polishing agent;

a basic component;

a polyoxyalkylene alkyl ether represented by Formula (i) RO-(AO) n —H, where R represents a linear or branched C 1 -C 15 alkyl group, A represents an alkylene group selected from a group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents the average number of moles of added AO groups, the number being from 2 to 30;

an aqueous carrier; and

a water-soluble polymer containing an alkylene polyalkylene oxide amine polymer including at least two repeating structural units having a tertiary amine with an alkylene group and a polyalkylene oxide group bonded to an N atom.

8. A chemical mechanical polishing method for a base material comprising the steps of:

bringing a base material into contact with a polishing pad and a chemical mechanical polishing composition of claim 1 ;

moving the polishing pad against the base material with the chemical mechanical polishing composition interposed therebetween; and

removing at least some of the base material to polish the base material.

9. A rinsing composition comprising:

a polyoxyalkylene alkyl ether represented by Formula (i) RO-(AO) n —H, where R represents a linear or branched C 11 -C 15 alkyl group, A represents an alkylene group selected from a group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents the average number of moles of added AO groups, the number being from 6 to 30 and an aqueous carrier.

10. A rinsing composition according to claim 9 , further comprising a water-soluble polymer other than the polyoxyalkylene alkyl ether.

11. A rinsing composition according to claim 10 , wherein the water-soluble polymer includes at least one type selected from a group consisting of a cellulose derivative, a polymer containing a polyvinyl alcohol structural unit, an alkylene polyalkylene oxide amine polymer including at least two repeating structural units having a tertiary amine with an alkylene group and a polyalkylene oxide group bonded to an N atom, and any combination thereof.

12. A rinsing composition according to claim 11 , wherein the water-soluble polymer includes a cellulose derivative, a polymer containing a polyvinyl alcohol structural unit, and an alkylene polyalkylene oxide amine polymer including at least two repeating structural units having a tertiary amine with an alkylene group and a polyalkylene oxide group bonded to an N atom.

13. A rinsing composition according to claim 11 , wherein the water-soluble polymer is a polymer containing a polyvinyl alcohol structural unit.

14. A rinsing method for a base material comprising the steps of:

bringing a base material after chemical mechanical polishing into contact with a polishing pad and a rinsing composition of claim 9 ; and

moving the polishing pad against the base material with the rinsing composition interposed therebetween.

15. A rinsing composition comprising: a polyoxyalkylene alkyl ether represented by Formula (i) RO-(AO) n —H, where R represents a linear or branched C 1 -C 15 alkyl group, A represents an alkylene group selected from a group consisting of an ethylene group, a propylene group, and a combination thereof, and n represents the average number of moles of added AO groups, the number being from 2 to 30;

an aqueous carrier; and

a water-soluble polymer containing an alkylene polyalkylene oxide amine polymer including at least two repeating structural units having a tertiary amine with an alkylene group and a polyalkylene oxide group bonded to an N atom.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2023
From: ENTEGRIS JAPAN CO., LTD.
To: ENTEGRIS, INC.
Reel/Frame 065746/0789 →
MERGER Recorded Nov 28, 2023
From: CMC MATERIALS KK
To: ENTEGRIS JAPAN CO., LTD.
Reel/Frame 065686/0902 →
SECURITY INTEREST Recorded Jul 8, 2022
From: CMC MATERIALS, INC.; INTERNATIONAL TEST SOLUTIONS, LLC; QED TECHNOLOGIES INTERNATIONAL, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 060615/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2021
From: MASUDA, TSUYOSHI; KITAMURA, HIROSHI; MATSUMURA, YOSHIYUKI; NAMIKI, AKIHISA
To: NIHON CABOT MICROELECTRONICS K.K.
Reel/Frame 054908/0197 →
CHANGE OF NAME Recorded Jan 13, 2021
From: NIHON CABOT MICROELECTRONICS K.K.
To: CMC MATERIALS KK
Reel/Frame 054979/0924 →
Priority Claims (1)
JP JP2018-133454 · Jul 13, 2018 · national
Continuity (1)
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