IP Library › Granted Patent US 6,572,925
Granted Patent Utility
US 6,572,925 · Confirmation No. 9543

PROCESS FOR FORMING A LOW DIELECTRIC CONSTANT FLUORINE AND CARBON-CONTAINING SILICON OXIDE DIELECTRIC MATERIAL

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2022-04-15 OATH Oath or Declaration filed 252 View
2001-02-23 TRNA Transmittal of New Application 1 View
2001-02-23 ADS Application Data Sheet 2 View
2001-02-23 SPEC Specification 18 View
2001-02-23 CLM Claims 3 View
2001-02-23 ABST Abstract 1 View
2001-02-23 DRW Drawings-only black and white line drawings 1 View
2001-02-23 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,572,925
App. No.
09/792,683
Filed
2001-02-23
Granted
2003-06-03
Pub. No.
US20020119326A1
Examiner
CHEN, BRET P
Art Unit
1762
PTA
0 days