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App. No. 09/792,691 · Confirmation No. 9496

PROCESS FOR FORMING A LOW DIELECTRIC CONSTANT FLUORINE AND CARBON-CONTAINING SILICON OXIDE DIELECTRIC MATERIAL CHARACTERIZED BY IMPROVED RESISTANCE TO OXIDATION

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2022-04-15 OATH Oath or Declaration filed 252 View
2003-09-24 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-09-24 LET. Miscellaneous Incoming Letter 2 View
2003-08-29 ACPA Continued Prosecution Application - Continuation (Amendment CPA) 2 View
2001-02-23 TRNA Transmittal of New Application 1 View
2001-02-23 ADS Application Data Sheet 2 View
2001-02-23 SPEC Specification 26 View
2001-02-23 CLM Claims 6 View
2001-02-23 ABST Abstract 1 View
2001-02-23 DRW Drawings-only black and white line drawings 2 View
2001-02-23 OATH Oath or Declaration filed 2 View
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Quick Facts
App. No.
09/792,691
Filed
2001-02-23
Granted
2003-11-18
Pub. No.
US20020117082A1
Examiner
CHEN, BRET P
Art Unit
1762
PTA
0 days