IP Library Granted Patent US 6,852,240
Granted Patent B2
US 6,852,240 · App. 09/793,350 · Granted Feb 8, 2005

Method of manufacturing a ferroelectric capacitor configuration

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Quick Facts
Patent No.
US 6,852,240
App. No.
09/793,350
Granted
Feb 8, 2005
Kind
B2
Abstract

A ferroelectric capacitor configuration is configured with at least two different coercitive voltages. A first electrode structure having a surface which forms at least two levels is firstly produced. A layer of ferroelectric material of varying thickness is deposited over the first electrode by spin coating. A second electrode structure is subsequently formed on the layer of ferroelectric material.

Claims (8)

1. A method of manufacturing a ferroelectric capacitor configuration with at least two different coercive voltages, which comprises the following steps:

depositing an electrically conductive oxygen diffusion barrier layer over a structure including a semiconductor substrate;

removing the barrier layer in certain regions for producing a step in the barrier layer;

depositing a first electrode structure onto the step in the barrier layer, transforming the barrier layer step into a step of the surface profile of the first electrode structure;

spin-coating a layer of ferroelectric material onto the first electrode structure, causing the step in the surface profile of the first electrode structure to provide for a first region of the ferroelectric material of a first layer thickness disposed over a lower level of the step and a second region of the ferroelectric material of a second layer thickness disposed over an upper level of the step, the first and second layer thicknesses being different, and the first and second regions of ferroelectric material with different layer thicknesses resulting in the two different coercive voltages in the ferroelectric capacitor configuration; and

producing a second electrode structure on the layer of ferroelectric material.

2. The method according to claim 1 , which comprises dividing the first electrode structure to form at least two capacitors.

3. The method according to claim 1 , which comprises dividing the second electrode structure to form at least two capacitors.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 3, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036539/0196 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0001 →