IP Library Granted Patent US 6,436,281
Granted Patent Utility
US 6,436,281 · Confirmation No. 2649

APPARATUS FOR TREATING WASTEWATER FROM A CHEMICAL-MECHANICAL POLISHING PROCESS USED IN CHIP FABRICATION

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Code Description Pages PDF
2015-08-07 OATH Oath or Declaration filed 11 View
2001-04-10 TRNA Transmittal of New Application 5 View
2001-04-10 SPEC Specification 16 View
2001-04-10 CLM Claims 2 View
2001-04-10 ABST Abstract 1 View
2001-04-10 DRW Drawings-only black and white line drawings 5 View
2001-04-10 OATH Oath or Declaration filed 4 View
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Quick Facts
Patent No.
US 6,436,281
App. No.
09/829,871
Filed
2001-04-10
Granted
2002-08-20
Pub. No.
US20010017277A1
Art Unit
1723
PTA
-32 days