IP Library › Granted Patent US 6,821,715
Granted Patent Utility
US 6,821,715 · Confirmation No. 7852

FULLY UNDERCUT RESIST SYSTEMS USING E-BEAM LITHOGRAPHY FOR THE FABRICATION OF HIGH RESOLUTION MR SENSORS

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Quick Facts
Patent No.
US 6,821,715
App. No.
09/853,345
Filed
2001-05-10
Granted
2004-11-23
Pub. No.
US20020167764A1
Art Unit
1756
PTA
0 days