IP Library › Granted Patent US 6,420,264
Granted Patent Utility
US 6,420,264 · Confirmation No. 7415

METHOD OF FORMING A SILICIDE REGION IN A SI SUBSTRATE AND A DEVICE HAVING SAME

Inventors: Somit Talwar, Yun Wang
Patented Case View Patent ↗
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 Code Description Pages PDF
2001-06-28 TRNA Transmittal of New Application 2 View
2001-06-28 SPEC Specification 18 View
2001-06-28 CLM Claims 5 View
2001-06-28 ABST Abstract 1 View
2001-06-28 DRW Drawings-only black and white line drawings 5 View
2001-06-28 OATH Oath or Declaration filed 4 View
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Quick Facts
Patent No.
US 6,420,264
App. No.
09/896,160
Filed
2001-06-28
Granted
2002-07-16
Art Unit
2813
PTA
0 days