Patent Assignment
Reel/Frame 014836/0879
Change of Name
Recorded: 2004-07-13
Received: 2004-07-13
Pages: 5
Assignor
ULTRATECH STEPPER, INC.
Executed: 2003-06-10
Assignee
ULTRATECH, INC.
3050 ZANKER ROAD, SAN JOSE, CA, 95134, UNITED STATES
Covered Properties
(24)
Method and Apparatus for Determining Best Focus Using Dark-Field Imaging
Application:
10/758,069 →
Radiation shield device and method
Application:
10/650,848 →
Imaging Stabilization Apparatus and Method for High-Performance Optical Systems
Application:
10/621,415 →
Method and System for Laser Thermal Processing of Semiconductor Devices
Application:
10/390,504 →
Variable Numerical Aperture Large-Field Unit-Magnification Projection System
Application:
10/336,066 →
Large-Field Unit-Magnification Projection System
Application:
10/330,567 →
Laser Scanning Apparatus and Methods for Thermal Processing
Application:
10/287,864 →
Dual-Sided Substrate Measurement Apparatus and Methods
Application:
10/213,868 →
Selective Absorption Process for Forming an Activated Doped Region in a Semiconductor
Application:
10/122,955 →
Method for Laser Thermal Processing Using Thermally Induced Reflectivity Switch
Application:
10/078,842 →
Magnetic Levitation Stage Apparatus and Method
Application:
10/023,144 →
System and Method for Reducing Colinearity Effects in Manufacturing Microdevices
Application:
10/035,764 →
Method and Apparatus for Mechanically Masking a Workpiece
Application:
09/973,790 →
Method for Semiconductor Gate Doping
Application:
09/941,817 →
Thermally Induced Reflectivity Switch for Laser Thermal Processing
Application:
09/940,102 →
Method of Forming Thermally Induced Reflectivity Switch for Laser Thermal Processing
Application:
09/933,795 →
Motion Compensation System and Method for Lithography
Application:
09/933,583 →
Method and Apparatus for Masking a Workpiece with Ink
Application:
09/923,755 →
Imaging Stabilization Apparatus and Method for High-Performance Optical Systems
Application:
09/923,734 →
Method of Forming a Silicide Region in a Si Substrate and a Device Having Same
Application:
09/896,160 →
Backside Alignment System and Method
Application:
09/855,486 →
Machine-Independent Alignment System and Method
Application:
09/855,485 →
Lithography System and Method for Device Manufacture
Application:
09/854,226 →
Computer Architecture for and Method of High-Resolution Imaging Using a Low-Resolution Image Transducer
Application:
09/816,800 →