IP Library › Granted Patent US 6,821,807
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US 6,821,807 · Confirmation No. 7536

METHOD OF FORMING NITRIDE-BASED SEMICONDUCTOR LAYER, AND METHOD OF MANUFACTURING NITRIDE-BASED SEMICONDUCTOR DEVICE

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2003-06-09 A.NE Response After Final Action 37 View
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2003-01-08 CTFR Final Rejection 6 View
2003-01-08 892 List of references cited by examiner 1 View
2002-11-27 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
2002-11-27 CLM Claims 1 View
2002-11-27 REM Applicant Arguments/Remarks Made in an Amendment 4 View
2002-11-27 XT/ Extension of Time 1 View
2002-06-28 CTNF Non-Final Rejection 5 View
2002-06-28 892 List of references cited by examiner 1 View
2002-06-28 1449 List of References cited by applicant and considered by examiner 1 View
2002-06-25 SRNT Examiner's search strategy and results 4 View
2002-06-24 SRNT Examiner's search strategy and results 1 View
2001-08-30 TRNA Transmittal of New Application 3 View
2001-08-30 SPEC Specification 23 View
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2001-08-30 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2001-08-30 SRFW Search information including classification, databases and other search related notes 1 View
2001-08-30 FWCLM Index of Claims 1 View
2001-08-30 TRNA Transmittal of New Application 3 View
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2001-08-30 CLM Claims 5 View
2001-08-30 OATH Oath or Declaration filed 3 View
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2001-08-30 FOR Foreign Reference 11 View
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Quick Facts
Patent No.
US 6,821,807
App. No.
09/941,982
Filed
2001-08-30
Granted
2004-11-23
Pub. No.
US20020048836A1
Art Unit
2812
PTA
-340 days