IP Library Granted Patent US 6,670,646
Granted Patent Utility
US 6,670,646 · Confirmation No. 7293

MASK AND METHOD FOR PATTERNING A SEMICONDUCTOR WAFER

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Code Description Pages PDF
2003-11-06 IFEE Issue Fee Payment (PTO-85B) 2 View
2002-02-11 TRNA Transmittal of New Application 3 View
2002-02-11 SPEC Specification 15 View
2002-02-11 CLM Claims 5 View
2002-02-11 ABST Abstract 1 View
2002-02-11 DRW Drawings-only black and white line drawings 4 View
2002-02-11 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,670,646
App. No.
10/074,479
Filed
2002-02-11
Granted
2003-12-30
Pub. No.
US20030153126A1
Examiner
NHU, DAVID
Art Unit
2818
PTA
-6 days