IP Library Granted Patent US 7,067,234
Granted Patent B2
US 7,067,234 · App. 10/186,651 · Granted Jun 27, 2006

Chemical consolidation of photoresists in the UV range

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,067,234
App. No.
10/186,651
Granted
Jun 27, 2006
Kind
B2
Abstract

Structured resists are consolidated, that is post-exposure amplified. The amplifying agent used is a compound which contains at least one bicyclic or polycyclic group. The amplifying agent is attached via a reactive group to a reactive anchor group of a polymer that is used for the resist. The process is particularly suitable for amplifying copolymers of cycloolefins and maleic anhydride.

Claims (24)

1. A method of consolidating structured resists, which comprises:

providing a substrate with a photoresist comprising at least one polymer containing anchor groups for attachment of an amplifying agent;

sectionally exposing and developing the resist to form a structured resist;

applying a silicon-free amplifying agent producing an increase in the etch resistance of the resist to the structured resist,

the amplifying agent containing at least one bicyclic or polycyclic non-aromatic group and at least one reactive group capable of coordinating to the anchor groups of the polymer; and

removing excess amplifying agent.

2. The process according to claim 1 , wherein the photoresist is a chemically amplified photoresist and the method further comprises subjecting the structured resist to flood exposure prior to the step of applying the amplifying agent.

3. The process according to claim 1 , wherein the photoresist is a chemically amplified photoresist comprising a thermoacid generator and the method further comprises heating the structured resist to a temperature at which an acid is liberated from the thermoacid generator.

4. The process according to claim 1 , which comprises applying the amplifying agent as a solution to the structured resist.

5. The process according to claim 4 , which comprises adding to the solution of the amplifying agent a swelling promoter for swelling the structured resist.

6. The process according to claim 1 , wherein the amplifying agent contains at least two reactive groups.

7. The process according to claim 1 , wherein the reactive group of the amplifying agent is a basic group.

8. The process according to claim 1 , wherein the amplifying agent is an amplifying agent selected from the group consisting of

bis(aminomethyl)adamantane, bis(aminoethyl)adamantane,

bis(aminopropyl)adamantane, norbornyldiamine,

bis(aminomethyl)norbornane, bis(aminoethyl)norbornane,

bis(aminopropyl)norbornane,

bis (aminomethyl)bicyclo [2.2.2]octane,

bis(aminoethyl)bicyclo[2.2.2]octane,

bis(aminopropyl)bicyclo[2.2.2]octane,

bis(aminomethyl)tricyclo[5.2.1.0 2,6 ] decane,

bis(aminoethyl)tricyclo[5.2 1.0 2,6 ] decane, and

bis(aminopropyl)tricyclo[5.2.1.0 2,6 ] decane.

9. The process according to claim 1 , wherein the polymer comprises repeating units containing groups selected from the group consisting of carboxylic acid anhydride groups and bicyclic or polycyclic non-aromatic groups.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 30, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036723/0021 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0457 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 26, 2006
From: ROTTSTEGGE, JORG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 017498/0278 →