Polishing pad sensor assembly with a damping pad
View Patent ↗A polishing pad having an optical assembly that does not cause excess wear on a wafer workpiece. The optical assembly is disposed within the pad such that it may move in response to forces applied to the optical assembly. A damping pad may be disposed on the optical assembly to reduce vibrations and further increase the sensitivity of optical measurements.
1. A polishing pad for use in chemical mechanical planarization of a wafer or other workpiece, said polishing pad comprising:
the polishing pad, characterized by a top surface and a bottom surface and a thickness, said polishing pad having a hole disposed therein, said hole extending substantially completely from the top surface to the bottom surface; and
a capsule disposed within the hole, said capsule housing a means for detecting characteristics of the wafer or other work piece during polishing; said capsule having a top surface which is substantially co-planar with the top surface of the pad and a thickness which is less than the thickness of the pad;
a damping pad disposed on a bottom surface of the capsule.
2. The polishing pad of claim 1 wherein:
the hole has an upper hole section and a lower hole section, and the lower section is larger than the upper hole section; and
the capsule is characterized by an upper capsule section and a lower capsule section, said upper capsule section sized and dimensioned to fit within the upper section of the hole, said lower capsule section sized and dimensioned to fit within the lower section of the hole.
3. The polishing pad of claim 2 wherein:
the upper hole section defines an overhanging lip over the lower hole section, and the capsule is secured to the pad by suspending the lower capsule section to the overhanging lip.
4. The polishing pad of claim 1 wherein:
the upper hole section defines an overhanging lip over the lower hole section, and the capsule is secured to the pad by suspending the lower capsule section to the overhanging lip.
5. A device suitable for polishing wafers, said device comprising:
a polishing pad;
a sensor assembly disposed within the polishing pad;
wherein the sensor assembly is further disposed within the polishing pad such that the sensor assembly may move up and down within the polishing pad; and
wherein the sensor assembly has a top surface and a bottom surface, and a damping pad is disposed on the bottom surface of the sensor assembly.
6. A polishing pad comprising:
an upper pad layer and a lower pad layer;
an optical assembly disposed within a hole in the upper and lower pad layers, said optical assembly having a flange, wherein said flange is disposed within a circular void in the lower pad layer and suspended from the pad upper layer with a bead of glue such that the optical assembly may move up and down within the polishing pad;
wherein the optical assembly has a top surface and a bottom surface and a damping pad is disposed on the bottom surface of the optical assembly.
7. The polishing pad of claim 6 further comprising a shim disposed on the flange.
8. The polishing pad of claim 7 wherein the top of the optical assembly has a beveled edge.
9. The polishing pad of claim 6 wherein the top of the optical assembly has a beveled edge.
10. A polishing pad comprising:
an upper pad layer and a lower pad layer, wherein a hole is disposed through the upper and lower pad layers, said hole having an upper hole section disposed in the upper pad layer and a lower hole section disposed in the lower pad layer, wherein the lower hole section is larger than the upper hole section;
a sensor assembly disposed within the hole, said sensor assembly comprising a sensor disposed within a sensor housing, said sensor housing having a top section and a bottom section, wherein an extension is disposed on the bottom section of the sensor housing;
wherein the extension is disposed within the lower hole section and wherein the extension is suspended from the upper pad layer;
wherein the sensor assembly has a top surface and a bottom surface, and a damping pad is disposed on the bottom surface of the sensor assembly.
11. The pad of claim 10 wherein the extension comprises a flexible membrane disposed on the bottom section of the optical assembly.
12. The pad of claim 10 wherein the thickness of the optical assembly and the thickness of the extension is small enough such that the sensor assembly may move up and down within the lower hole section.
13. The pad of claim 12 wherein the sensor comprises an optical sensor.
14. The pad of claim 10 wherein the sensor comprises an optical sensor.
15. A device suitable for polishing wafers, said device comprising:
a polishing pad;
a sensor puck disposed within the polishing pad, said sensor puck having a top surface and a bottom surface, wherein the top surface of the puck is substantially coplanar with the polishing surface of the polishing pad;
wherein the sensor puck is further disposed within the polishing pad such that the sensor puck may move up and down within the polishing pad; and
a damping pad disposed on the bottom surface of the sensor puck.
16. The device of claim 15 wherein the damping pad has a thickness from about 9 mil to about 20 mil.
17. The device of claim 16 wherein the damping pad is secured to the sensor puck with a layer of glue.
18. The device of claim 17 wherein the damping pad has a hardness of about 40 Shore A and the optical puck has a hardness of about 90 Shore A.
19. The device of claim 18 wherein the damping pad occupies an area corresponding to substantially the entire bottom surface of the sensor puck.
20. The device of claim 18 wherein the damping pad occupies an area corresponding to substantially the entire bottom surface of the sensor puck plus the entire bottom surface of a flange disposed on the bottom of the sensor puck.