IP Library Granted Patent US 6,745,380
Granted Patent Utility
US 6,745,380 · Confirmation No. 7586

METHOD FOR OPTIMIZING AND METHOD FOR PRODUCING A LAYOUT FOR A MASK, PREFERABLY FOR USE IN SEMICONDUCTOR PRODUCTION, AND COMPUTER PROGRAM THEREFOR

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Code Description Pages PDF
2004-04-23 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-09-03 TRNA Transmittal of New Application 2 View
2002-09-03 SPEC Specification 21 View
2002-09-03 CLM Claims 12 View
2002-09-03 ABST Abstract 1 View
2002-09-03 DRW Drawings-only black and white line drawings 9 View
2002-09-03 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,745,380
App. No.
10/233,691
Filed
2002-09-03
Granted
2004-06-01
Pub. No.
US20030046654A1
Examiner
DO, THUAN V
Art Unit
2825
PTA
-3 days