Low stress semiconductor die attach
View Patent ↗A semiconductor device ( 121 ) is provided which comprises a substrate and a die ( 123 ) having a first surface which is attached to the substrate by way of a die attach material. At least a portion ( 127 ) of the perimeter of the die is resistant to wetting by the die attach material, either through treatment with a dewetting agent or by selective removal of the backside metallization. It is found that this construction allows the surface area of the die to be increased without increasing the incidence of cracking and chipping along the sawn edges of the die.
1. A semiconductor device, comprising:
a substrate;
a die having a first surface which is attached to said substrate by way of a die attach material comprising an adhesive; and
a dewetting agent disposed around the entire perimeter of the die;
wherein said dewetting agent comprises a fatty acid and is resistant to wetting by said die attach material.
2. The semiconductor device of claim 1 , wherein the first surface has a metallization layer thereon, and wherein the metallization layer is not present in said portion of the perimeter of the die that is resistant to wetting by said die attach material.
3. The semiconductor device of claim 1 , wherein the die has a plurality of sawn edges.
4. The semiconductor device of claim 1 , wherein said substrate is a packaging substrate.
5. A semiconductor device, comprising:
a packaging substrate;
a die having a first surface which is attached to said packaging substrate by way of an adhesive; and
a source via;
wherein at least a portion of the perimeter of the first surface of the die has a dewetting agent disposed thereon, wherein said dewetting agent comprises a fatty acid, and wherein said dewetting agent is disposed about said source via.
6. The semiconductor device of claim 5 , wherein said die comprises GaAs.
7. The semiconductor device of claim 5 , wherein said dewetting agent has a first portion which is disposed as a band around the perimeter of the die, and a second portion, separate from the first portion, which is disposed about said source via.
8. The semiconductor device of claim 5 , wherein the die has a thickness of less than about 40 microns.
9. The semiconductor device of claim 5 , wherein said dewetting agent is disposed about the entire perimeter of said first surface of said die.
10. A semiconductor device, comprising:
a packaging substrate; and
a die equipped with a source via and having a first surface which is attached to said packaging substrate by way of an adhesive;
wherein the die has a dewetting agent disposed thereon which comprises a fatty acid and which is disposed on the first surface as first and second separate portions, wherein said first portion is disposed as a band around the perimeter of the die, and wherein said second portion is disposed about said source via.
11. The semiconductor device of claim 5 , wherein the die has a plurality of sawn edges, and wherein the dewetting agent is disposed along the perimeter of each of said plurality of sawn edges.
12. The semiconductor device of claim 10 , wherein the die has a plurality of sawn edges, and wherein the dewetting agent is disposed along the perimeter of each of said plurality of sawn edges.
13. The semiconductor device of claim 1 , wherein said die comprises GaAs.
14. The semiconductor device of claim 10 , wherein said die comprises GaAs.
15. The semiconductor device of claim 1 , further comprising a source via, and wherein said dewetting agent is also disposed around said source via.
16. The semiconductor device of claim 15 , wherein said dewetting agent has a first portion which is disposed as a band around the perimeter of the die, and a second portion, separate from the first portion, which is disposed about said source via.
17. The semiconductor device of claim 1 , wherein the die has a thickness of less than about 40 microns.
18. The semiconductor device of claim 10 , wherein the die has a thickness of less than about 40 microns.
19. The semiconductor device of claim 5 , wherein said first surface has a metallization layer thereon, and wherein said metallization layer is not present in said portion of the perimeter of the die that is resistant to wetting by said die attach material.
20. The semiconductor device of claim 10 , wherein said first surface has a metallization layer thereon, and wherein said metallization layer is not present in said portion of the perimeter of the die that is resistant to wetting by said die attach material.