IP Library Granted Patent US 7,178,236
Granted Patent B2
US 7,178,236 · App. 10/418,510 · Granted Feb 20, 2007

Method for constructing a membrane probe using a depression

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Quick Facts
Patent No.
US 7,178,236
App. No.
10/418,510
Granted
Feb 20, 2007
Kind
B2
Abstract

A method for constructing a membrane probe that includes providing a substrate, and creating a depression within the substrate. Conductive material is located within the depression and a conductive trace is connected to the conductive material. A membrane is applied to support the conductive material and the substrate is removed from the conductive material.

Claims (39)

1. A method of constructing a membrane probe comprising:

(a) providing a substrate that includes a depression therein;

(b) locating conductive material within said depression, a conductive trace electrically connected to said conductive material, and membrane supporting said conductive material, at least a portion of said membrane interposed between said conductive trace and said substrate; and

(c) removing said substrate from said conductive material.

2. The method of claim 1 further including the step of pressing a tool into contact with said substrate to create said depression.

3. The method of claim 1 further including the step of creating a second depression with a tool.

4. The method of claim 3 further including the step of moving said tool laterally relative to said substrate to create said second depression.

5. The method of claim 1 including forming a vertical stop on a tool wherein said tool is used to create said depression.

6. The method of claim 1 wherein a tool used to create said depression has a shaping portion used to create said first depression.

7. The method of claim 6 wherein said shaping portion has inclined sidewalls.

8. The method of claim 6 wherein said membrane is applied prior to said trace.

9. The method of claim 6 wherein said shaping portion has an inclined surface between a tail and a head.

10. The method of claim 6 wherein said shaping portion has a head and a tail, and said tail is thinner than said head.

11. The method of claim 1 wherein said substrate is a ductile material.

12. The method of claim 1 wherein a tool used to create said depression is formed from a material that is harder than said substrate.

13. The method of claim 1 further comprising the step of creating a second depression.

14. The method of claim 13 wherein said first depression is substantially similar to said second depression.

15. The method of claim 1 further comprising the step of patterning an insulative layer on said support.

16. The method of claim 15 wherein said insulative layer is patterned on said support prior to creating said first depression.

17. The method of claim 15 wherein said insulative layer defines an opening and said depression is created at a location corresponding with said opening.

18. The method of claim 1 wherein said conductive material contains at least one of nickel and rhodium.

19. The method of claim 1 further comprising the step of forming an exterior layer of rhodium on said conductive material.

20. The method of claim 19 wherein said exterior layer of rhodium forms a v-shape.

21. The method of claim 1 wherein said step of locating conductive material within said depression comprises electroplating said conductive material onto said support.

22. The method of claim 1 wherein said conductive material is deposited uniformly.

23. The method of claim 1 further comprising the step of planarizing said conductive material after locating said conductive material in said depression.

24. The method of claim 1 further comprising the step of forming said depression so that said conductive material has a substantially flat surface inclined with respect to a supporting surface of said membrane support.

25. The method of claim 1 further comprising the step of forming said depression so that said conductive material is substantially pyramidal in shape.

26. The method of claim 1 further comprising the step of polishing said substrate prior to creating said depression.

27. The method of claim 1 further comprising the step of forming a roughened surface on said conductive material.

28. The method of claim 1 wherein said substrate has a crystal grain and said depression has at least one substantially flat surface inclined relative to said crystal grain, said surface and said crystal grain defining an acute angle therebetween.

29. A method of creating a probe comprising

(a) providing a substrate with a pattern thereon defining a plurality of openings;

(b) creating a set of depressions within said openings;

(c) locating conductive material within said depressions, a conductive trace electrically connected to said conductive material, and membrane supporting said conductive material, at least a portion of said membrane interposed between said conductive trace and said substrate; and

(d) removing said substrate from said conductive material.

30. The method of claim 29 wherein said membrane is applied after connecting said conductive trace to said conductive material.

31. The method of claim 29 wherein said depressions are created by pressing a tool into said substrates.

32. The method of claim 31 including the step of moving said tool laterally relative to said substrate to create said depressions.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Aug 7, 2025
From: HSBC BANK USA, NATIONAL ASSOCIATION
To: FORMFACTOR, INC.
Reel/Frame 072853/0001 →
CHANGE OF NAME Recorded Mar 13, 2019
From: CASCADE MICROTECH, INC.
To: FORMFACTOR BEAVERTON, INC.
Reel/Frame 049949/0542 →
CHANGE OF NAME Recorded Jul 18, 2018
From: CASCADE MICROTECH, INC.
To: FORMFACTOR BEAVERTON, INC.
Reel/Frame 046573/0664 →
SECURITY INTEREST IN UNITED STATES PATENTS AND TRADEMARKS Recorded Jul 12, 2016
From: FORMFACTOR, INC.; ASTRIA SEMICONDUCTOR HOLDINGS, INC.; CASCADE MICROTECH, INC.; MICRO-PROBE INCORPORATED
To: HSBC BANK USA, NATIONAL ASSOCIATION
Reel/Frame 039184/0280 →