RF semiconductor devices and methods for fabricating the same
View Patent ↗RF semiconductor devices and methods of making the same are disclosed. In a disclosed method, a trench for defining an active region and an element isolation region is formed in a semiconductor substrate. One or more gate lines is then formed within the active region. Next, an insulating layer is formed on the semiconductor substrate and the gate lines. Contact holes are then formed in the insulating layer. Contact plugs are then formed in the contact holes. Thereafter, a conductive pattern is electrically connected with the contact plugs.
1. A method for fabricating an RF semiconductor device comprising:
forming a trench to define an active region and an element isolation region in a semiconductor substrate;
forming a plurality of gate lines within the active region of the semiconductor substrate, the plurality of gate lines running perpendicularly to the trench and not extending over a center of the trench;
forming an insulating layer on the plurality of gate lines and the semiconductor substrate;
forming contact holes in the insulating layer over the active region using a single pattern, wherein a first group of the contact holes exposes portions of the gate lines and a second group of the contact holes exposes portions of the substrate in the active region;
forming contact plugs in each of the contact holes; and
forming a conductive pattern layer over the insulating layer that is electrically connected with the contact plugs.
2. A method as defined in claim 1 , wherein the gate lines are not connected with each other in the element isolation region.
3. A method as defined in claim 1 , wherein at least two of the plurality of gate lines are connected in the active region.
4. A method as defined in claim 1 , wherein a thickness of the insulating layer is about 1000 to about 20000 angstroms.
5. A method as defined in claim 1 , wherein a thickness of the conductive pattern layer is above 10000 angstroms.
6. A method as defined in claim 1 , wherein the insulating layer comprises an oxide or a polyimide.
7. A method as defined in claim 1 , wherein forming the plurality of gate lines minimizes parasitic capacitance between the plurality of gate lines and the substrate.
8. A method as defined in claim 1 , wherein forming the plurality of gate lines minimizes resistance of the plurality of gate lines.
9. A method as defined in claim 1 , further comprising metal contacts linking at least two of the plurality of gate lines.
10. A method as defined in claim 1 , wherein the plurality of gate lines do not extend along a longitudinal axis of the trench.
11. A method as defined in claim 1 , wherein adjacent gate lines are formed at a substantially constant distance along their lengths.
12. A method as defined in claim 1 , wherein the second group of contact holes are formed between the plurality of gate lines.
13. A method as defined in claim 1 , wherein the element isolation region comprises the trench.
14. A method as defined in claim 1 , wherein forming the contact plugs comprises:
forming a first conductive layer over the insulating layer and in the contact holes; and
planarizing the first conductive layer.
15. A method as defined in claim 14 , wherein planarizing the first conductive layer exposes an upper surface of the insulating layer.
16. A method as defined in claim 1 , wherein the insulating layer comprises a low temperature oxide.
17. A method as defined in claim 1 , wherein the plurality of gate lines do not extend longitudinally along a longitudinal axis of the trench.
18. A method as defined in claim 1 , wherein the plurality of gate lines do not extend horizontally along a longitudinal axis of the trench.