IP Library Patent Application 10627906
Patent Application Utility
App. No. 10/627,906 · Confirmation No. 3446

POLYMERIZABLE COMPOSITION, POLYMER, RESIST, AND PROCESS FOR ELECTRON BEAM LITHOGRAPHY

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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2017-07-26 OATH Oath or Declaration filed 18 View
2004-09-07 IFEE Issue Fee Payment (PTO-85B) 1 View
2004-06-03 NOA Notice of Allowance and Fees Due (PTOL-85) 3 View
2004-06-03 NOA Notice of Allowance and Fees Due (PTOL-85) 3 View
2004-06-03 1449 List of References cited by applicant and considered by examiner 1 View
2004-06-03 892 List of references cited by examiner 1 View
2004-06-03 CLM Claims 5 View
2004-06-03 SRFW Search information including classification, databases and other search related notes 1 View
2004-06-03 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2004-05-14 LET. Miscellaneous Incoming Letter 1 View
2004-05-11 SRNT Examiner's search strategy and results 31 View
2003-12-16 OATH Oath or Declaration filed 3 View
2003-11-14 OATH Oath or Declaration filed 3 View
2003-11-06 PEFN Pre-Exam Formalities Notice 2 View
2003-10-02 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2003-10-02 PA.. Power of Attorney 1 View
2003-10-02 LET. Miscellaneous Incoming Letter 2 View
2003-07-25 TRNA Transmittal of New Application 2 View
2003-07-25 SPEC Specification 13 View
2003-07-25 CLM Claims 5 View
2003-07-25 ABST Abstract 1 View
2003-07-25 DRW Drawings-only black and white line drawings 1 View
2003-07-25 OATH Oath or Declaration filed 2 View
2003-07-25 FRPR Certified Copy of Foreign Priority Application 17 View
2003-07-25 WFEE Fee Worksheet (SB06) 1 View
2003-07-25 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/627,906
Filed
2003-07-25
Granted
2004-11-23
Pub. No.
US20040081910A1
Art Unit
1752
PTA
-4 days