Chemical mechanical planarization pad
View Patent ↗A Chemical Mechanical Planarization (CMP) Pad. The CMP pad may be hydrophobic due to the incorporation of metal complexing agents. The CMP pad substantially retaining planarazation characteristics throughout planarization applications. Shearing, hardness, wearing, water absorbtion and electrical characteristics of the CMP pad remain substantially constant during CMP applications.
1. A hydrophobic chemical mechanical planarization (HCMP) pad comprising:
an organic polymer; and
a metal agent, wherein the metal agent includes at least one β-diketonate ligand,
wherein the metal agent includes one of cobalt, palladium, nickel, titanium, zirconium, hafnium, and copper, and wherein the pad is useful for planarizing a semiconductor wafer.
2. The HCMP pad of claim 1 wherein said organic polymer comprises one of a polyurethane or a polyether based material.
3. The HCMP pad of claim 1 wherein said organic polymer is formed of a polyol and di-isocyanate.
4. The HCMP pad of claim 1 wherein said organic polymer is reactive with one of a polyfunctional amine, a diamine, a triamine, a polyfunctional hydroxyl, and a mixed functionality hydroxylamine.
5. The HCMP pad of claim 1 further comprising a matrix material selected from the group consisting of a urethane, a melamine, a polyester, a polysulfone, polyvinyl acetate, a fluorinated hydrocarbon, and mixtures and copolymers thereof.
6. The HCMP pad of claim 1 wherein the HCMP pad further comprises pores.
7. The HCMP pad of claim 1 wherein the α-diketonate ligand includes a side group selected from hydrogen, an aryl, a perfluoraryl, an alkyl, a perfluoroalkyl, and a t-butyl group.
8. The HCMP pad of claim 1 wherein a metal feature on the semiconductor wafer is isolated during planarization.
9. The HCMP pad of claim 1 wherein said metal agent includes a metal compatible with a metal of the metal feature.
10. The HCMP pad of claim 1 , wherein said pad substantially retains a planarization characteristic during the planarization.
11. The HCMP pad of claim 10 wherein the planarization characteristic is one of shearing, hardness, wearing, cross-linking, water uptake and electrical character.
12. The HCMP pad of claim 1 , wherein said pad substantially avoids uptake of aqueous slurry during the planarization.
13. The HCMP pad of claim 1 wherein said organic polymer comprises a urethane.
14. The HCMP pad of claim 1 wherein the metal agent includes a side group selected from an aryl, a perfluoraryl, an alkyl, a perfluoroalkyl, and a t-butyl group.
15. The HCMP pad of claim 1 wherein the metal agent further includes at least one additional ligand comprising the formula —OR, wherein R is selected from the group consisting of hydrogen, an aryl, an alkyl, a perfluoroaryl, a perfluoroalkyl, and combinations thereof.
16. A method comprising mixing an organic polymer and a metal agent to form a chemical mechanical planarization (CMP) pad, wherein the metal agent includes at least one β-diketonate ligand, and wherein the metal agent includes one of cobalt, palladium, nickel, titanium, zirconium, hafnium, and copper.
17. The method of claim 16 further comprising:
adding a foaming agent and a curing agent to the organic polymer and metal agent to form a CMP material;
reducing pressure around the CMP material; and
heating the CMP material to form the CMP pad.
18. The method of claim 17 further comprising obtaining a hydrophobic CMP pad from a log formed of the CMP material.
19. A method of fabricating a semiconductor device, said method comprising:
providing a hydrophobic chemical mechanical planarization (HCMP) pad according to claim 1 ; and
planarizing the semiconductor device with the HCMP pad during the fabrication of said device.
20. The method of claim 19 wherein the planarizing further comprises:
delivering an aqueous slurry to a surface of the HCMP pad;
moving the HCMP pad in a first direction; and
moving the semiconductor device in a second direction different from the first direction.
21. The method of claim 16 , wherein the metal agent is dissolved in an organic solvent.
22. The method of claim 16 , wherein the HCMP pad further comprises pores.
23. The method of claim 16 , wherein the α-diketonate ligand includes a side group selected from hydrogen, an aryl, a perfluoraryl, an alkyl, a perfluoroalkyl, and a t-butyl group.
24. The method of claim 16 , wherein the metal agent further includes at least one additional ligand comprising the formula —OR, wherein R is selected from the group consisting of hydrogen, an aryl, an alkyl, a perfluoroaryl, a perfluoroalkyl, and combinations thereof.