Method for fabricating trench capacitor with insulation collar electrically connected to substrate through buried contact, in particular, for a semiconductor memory cell

1. A method for fabricating a trench capacitor in a substrate, which comprises:

providing a trench with trench walls in the substrate utilizing a hard mask with a corresponding mask opening, the trench having the lower, central, and upper trench regions;

providing a capacitor dielectric in the lower and central trench regions;

providing an insulation collar in the central and upper trench regions, the insulation collar having a topside;

providing an electrically conductive filling at least as far as the topside of the insulation collar;

subsequently depositing a nitride liner layer;

subsequently completely filling the trench with a filling material;

carrying out an STI trench fabrication process;

removing the filling material and sinking the electrically conductive filling to below the topside of the insulation collar;

subsequently forming spacers at the trench walls above the insulation collar;

removing portions of the spacers disposed above the connection region;

forming an insulation region on a first side with respect to the substrate above the insulation collar;

masking at least one portion of the spacers disposed above the insulation region with a silicon liner;

uncovering a connection region on a different side with respect to the substrate above the insulation collar; and

forming a buried contact electrically connecting the filling of the trench to the substrate on one side of the trench by depositing and etching back a metallic filling.

2. The method according to claim 1 , wherein the substrate has a topside and which further comprises after etching back the metallic filling, providing an insulation cover in the upper trench region at least as far as the topside of the substrate.

3. The method according to claim 1 , wherein the hard mask has a topside and the substrate has a topside, and which further comprises:

carrying out the tilling step by providing the filling as far as the topside of the hard mask; and

providing the insulation collar as far as above the topside of the substrate.

4. The method according to claim 1 , which further comprises providing the metallic filling from TiN.

5. The method according to claim 1 , wherein the metallici tilling is of TiN.

6. The method according to claim 1 , which further comprises;

providing a semiconductor memory cell having a planar selection transistor in the substrate; and

electrically connecting the burled contact to the selection transistor.

7. The method according to claim 1 , which further comprises;

providing a semiconductor memory cell having a planar selection transistor in the substrate; and

electrically connecting the buried contact to the memory cell.

8. The method according to claim 1 , which further comprises;

providing a plurality of semiconductor memory cells each having a planar selection transistor in the substrate;

providing a plurality of the trench capacitor in the substrate to form a trench capacitor array; and

electrically connecting each buried contact of a trench capacitor to one of the memory cells.

9. A method for fabricating a trench capacitor in a substrate, which comprises:

providing a trench in the substrate utilizing a hard mask with a corresponding mask opening, the trench having the lower, central, and upper trench regions;

providing a capacitor dielectric in the lower and central trench regions;

providing an insulation collar in the central and upper trench regions, the insulation collar having a topside;

providing an electrically conductive filling as far as the topside of the insulation collar;

subsequently filling the trench completely with a filling material;

carrying out an STI trench fabrication process;

removing the filling material and sinking the electrically conductive filling to below the topside of the insulation collar;

subsequently depositing a nitride liner layer and a silicon liner layer;

forming an insulation region on a first side with respect to the substrate above the insulation collar;

subsequently forming a spacer from the silicon liner layer above the nitride liner layer in the insulation region;

removing the nitride liner layer disposed above the connection region;

masking the nitride liner layer disposed above the insulation region with the spacer made from the silicon liner layer;

uncovering a connection region on a different side with respect to the substrate above the insulation collar; and

forming a buried contact electrically connecting the filling of the trench to the substrate on one side of the trench by depositing and etching back a metallic filling.

10. A method for fabricating a trench capacitor in a substrate, which comprises:

providing a trench in the substrate utilizing a hard mask with a corresponding mask opening, the trench having the lower, central, and upper trench regions;

providing a capacitor dielectric in the lower and central trench regions;

providing an insulation collar in the central and upper trench regions, the insulation collar having a topside;

providing an electrically conductive filling as far as the topside of the insulation collar;

forming an insulation region on a first side with respect to the substrate above the insulation collar;

subsequently depositing a nitride liner layer;

subsequently depositing a first silicon liner layer;

subsequently forming a spacer from the silicon liner layer in the insulation region;

subsequently depositing a second nitride liner layer; and

subsequently filling the trench completely with the filling material;

carrying out an STI trench fabrication process;

removing the filling material and sinking the electrically conductive filling to below the topside of the insulation collar;

uncovering a connection region on a different side with respect to the substrate above the insulation collar; and

forming a buried contact electrically connecting the filling of the trench to the substrate on one side of the trench by depositing and etching back a metallic filling.

11. The method according to claim 10 , which further comprises, after removing the filling material, removing the first and second nitride liner layers apart from a region masked by the spacer made from the silicon liner layer.

12. The method according to claim 10 , wherein the substrate has a topside, and which further comprises:

removing the filling material as far as the topside of the substrate;

subsequently depositing a silicon liner layer and removing the silicon liner layer on a side of the contact region;

subsequently sinking at least a part of the insulation collar in the upper trench region, the sunken part having a topside; and

subsequently sinking the filling to below the topside of the sunken part of the insulation collar.

13. The method according to claim 10 , wherein the substrate has a topside, and which further comprises:

removing the filling as far as the topside of the substrate;

subsequently depositing a silicon liner layer and removing the silicon liner layer on a side of the contact region;

subsequently sinking at least a part of the insulation collar in the upper trench region, the sunken part having a topside; and

subsequently sinking the filling to below the topside of the sunken part of the insulation collar.