Process for generating a hard mask for the patterning of a layer
View Patent ↗A process for generating a hard mask for the patterning of a first layer includes applying a second layer, which includes carbon, to the first layer that is to be patterned. A third layer, which includes silicon and carbon, is spun onto the second layer and an organic antireflection coating layer that is to be used with an overlying photoresist layer patternable using 193 nm technology, is appllied to the spun-on third layer.
1. A process for generating a hard mask for pattetning a first layer, which comprises the steps of:
applying a second layer containing carbon, to the first layer, which is to be patterned;
spinning a third layer containing silicon and carbon, onto the second layer; and
applying an organic antireflection coating layer to the third layer, the antireflection coating layer to be used with an overlying photoresist layer that is patternable using 193 nm technology.
2. The process according to claim 1 , which further comprises spinning the organic antireflection coating layer onto the third layer.
3. The process according to claim 1 , which further comprises during subsequent patterning of the first layer, lithographically patterning the organic antireflection coating layer and the third layer using an etchant.
4. The process according to claim 3 , which further comprises patterning the second layer using a further etchant, a pattern of the organic antireflection coating layer and of the third layer functioning as a mask, before the first layer which is to be patterned is patterned using the hard mask.
5. The process according to claim 4 , which further comprises using a fluorine-based etchant as the etchant and an oxygen-based etchant as the further etchant.
6. The process according to claim 1 , which further comprises:
applying a photoresist layer above the organic antireflection coating layer; and
patterning the photoresist layer using 193 nm technology.