Method for improving a simulation model of photolithographic projection

1. A method for improving a photolithographic simulation of the projection of a pattern of structure elements formed on a photomask onto a substrate comprising:

providing a pattern of structure elements;

providing a simplifying simulation model that describes the physical or chemical processes during lithography with an exposure apparatus without taking account of frequency-dependent transmissions of different orders of diffraction;

executing a simulation of the projection of the pattern onto a resist layer applied on a substrate of a semiconductor wafer in the exposure apparatus for the purpose of forming a patterned resist layer with the simulation model;

calculating an intensity distribution in the substrate plane in a two-dimensional simulation of the imaging of the pattern with calculation of an intensity distribution in the Fourier space;

providing a two-dimensional filter function;

calculating a frequency-dependent intensity loss that occurs during the execution of a simulation of the pattern by multiplication of the intensity distribution in the Fourier space by the filter function in order to achieve a matching of the simulation result of the simulation model with a more exact simulation that takes account of the frequency-dependent transmission of different orders of diffraction; and

optimizing the geometry of the structure elements of the pattern and/or parameters of the lithographic projection in order to achieve an improved dimensional accuracy for subsequent imagings.

2. The method of claim 1 , wherein the simulation of the projection of the pattern is effected on the basis of a model with a plurality of coupled parameters.

3. The method of claim 1 , further comprising:

lithographic patterning of the semiconductor wafer with the pattern by means of the exposure apparatus in order to form a resist structure; and

measuring the resist structure;

wherein the filter function is executed such that it has at least one fit parameter, the at least one fit parameter being chosen such that simulated structure elements correspond to the measured resist structure.

4. The method of claim 3 , wherein the filter function comprises a Gaussian function, the half value width of the Gaussian function corresponding to the fit parameter and being determined by measurement of the patterned resist layer.

5. The method of claim 1 , wherein the filter function is executed such that it has at least one fit parameter, the at least one fit parameter of the filter function being determined empirically.

6. The method of claim 1 , wherein the filter function is determined by means of a simulated resist structure.

7. The method of claim 6 , wherein the angle dependence of the light reflection at a resist surface of the resist layer is calculated during the determination of the simulated resist structure with a transfer matrix model.

8. The method of claim 6 , wherein the diffraction and near field effects at the photomask are calculated during the determination of the simulated resist structure with a three-dimensional model.

9. The method of claim 1 , wherein the calculated intensity distribution is used for determining OPC structures of a circuit pattern in the simulation.

10. The method of claim 1 , wherein a line-gap pattern having a different periodicity in different directions is provided during the step of providing the pattern.