Method for through-plating field effect transistors with a self-assembled monolayer of an organic compound as gate dielectric
View Patent ↗A method for through-plating field effect transistors with a self-assembled monolayer of an organic compound as gate dielectric includes through-plating by patterning a gate electrode material, and bringing an organic compound having dielectric properties into contact with the contact hole material and the gate electrode material. A contact hole material and the gate electrode material are at least partially uncovered. The contact hole is material not identical to the gate electrode material. A self-assembled monolayer of the organic compound is formed above the gate electrode material. The method also includes depositing and patterning the source and drain contacts without removing the self-assembled monolayer of the organic compound, and depositing a semiconductor material.
1. A method for through-plating field effect transistors, comprising:
patterning a gate electrode material in relation to a substrate to form a gate electrode at a first region of the substrate;
depositing a contact hole material at a second region of the substrate separated from the first region such that the gate electrode is spaced from the contact hole material after deposition of the contact hole material, wherein the contact hole material is different from the gate electrode material;
depositing an organic compound that is selective with respect to the gate electrode material in relation to the contact hole material so as to form a self-assembled monolayer that is located above the gate electrode material and that covers the gate electrode while leaving at least a portion of the contact hole material exposed, wherein the formed organic compound has dielectric properties;
depositing and patterning source and drain contacts proximate the gate electrode without removing the self-assembled monolayer of the organic compound; and
depositing a semiconductor material.
2. The method of claim 1 , wherein the gate electrode material is selected from the group consisting of Al, Ti, TiN, Ta, TaN, W, TiW, TaW, WN, WCN, IrO, RuO, and SrRuO, and the contact hole material is selected from the group consisting of gallium arsenide, indium phosphide, Au, Pt, Pd, and Ag.
3. The method of claim 1 , wherein the contact hole material is selected from the group consisting of Al, Ti, TiN, Ta, TaN, W, TiW, TaW, WN, WCN, IrO, RuO, and SrRuO, and the gate electrode material is selected from the group consisting of gallium arsenide, indium phosphide, Au, Pt, Pd, and Ag.
4. The method of claim 1 , wherein the gate electrode material includes a metal oxide layer at a surface of the gate electrode material.
5. The method of claim 1 , wherein the contact hole material includes a metal oxide layer at a surface of the contact hole material.
6. The method of claim 2 , wherein the organic compound comprises a phosphonic acid derivative.
7. The method of claim 2 , wherein the organic compound has the formula R-PO(OM) 2 , where R is one of an n-alkyl, n-alkyl ether, and a linear aromatic group of the formula -(C 6 H 4 )n-, where the n-alkyl and n-alkyl ether groups have between 4 and 20 C atoms, n is an integer between 2 and 6 and M is one of H, metal and an organic radical.
8. The method of claim 1 , wherein the semiconductor material is an organic polymer.
9. The method of claim 8 , wherein the organic polymer is selected from the group consisting of pentacene, tetracene, and polythiophene.
10. The method of claim 2 , wherein the gate electrode material includes a metal oxide layer at a surface of the gate electrode material.
11. The method of claim 3 , wherein the contact hole material includes a metal oxide layer at a surface of the contact hole material.
12. The method of claim 1 , wherein the organic compound includes a radical selected from the group consisting of R-SiCl 3 , R-SiCl 2 alkyl, R-SiCl(alkyl) 2 , R-Si(OR) 3 , R-Si(OR) 2 alkyl, R-SiOR(alkyl) 2 , R-PO(OH) 2 , R-CHO, R-CH═CH 2 , SH, OH, NH 2 , COOH, CONH 2 , CONHOH, CONHNH 2 , and CN, where R is one of an n-alkyl, n-alkyl ether and a linear aromatic group of the formula -(C 6 H 4 )n-, where the n-alkyl and n-alkyl ether groups have between 4 and 20 C atoms and n is an integer between 2 and 6.
13. The method of claim 3 , wherein the organic compound includes a radical selected from the group consisting of SH, OH, NH 2 , NHR, NR 2 , COOH, CONH 2 , CN, CONHOH, CONHNH 2 , and PR 2 , where R is one of an n-alkyl, n-alkyl ether and a linear aromatic group of the formula -(C 6 H 4 )n-, where the n-alkvl and n-alkvl ether groups have between 4 and 20 C atoms and n is an integer between 2 and 6.
14. The method of claim 4 , wherein the organic compound has the formula R-PO(OM) 2 , where R is one of an n-alkyl, n-alkyl ether and a linear aromatic group of the formula -(C 6 H 4 )n-, where the n-alkyl and n-alkyl ether groups have between 4 and 20 C atoms and n is an integer between 2 and 6 and M is one of H, metal, and an organic radical.
15. The method of claim 1 , wherein the organic compound comprises a polythiophene.