Semiconductor device and method of manufacture
View Patent ↗A semiconductor component and method of manufacture, including an insulated gate bipolar transistor (IGBT) ( 100, 200 ) that includes a semiconductor substrate ( 110 ) having a first conductivity type and buried semiconductor region ( 115 ) having a second conductivity type located above the semiconductor substrate. The IGBT further includes a first semiconductor region ( 120 ) having the first conductivity type located above the buried semiconductor region, a second semiconductor region ( 130 ) having the second conductivity type located above at least a portion of the first semiconductor region, an emitter ( 150 ) having the second conductivity type disposed in the second semiconductor region, and a collector ( 170 ) having the second conductivity type disposed in the first semiconductor region. A sinker region ( 140 ) is provided to electrically tie the buried semiconductor region ( 115 ) to the second semiconductor region ( 130 ). In a particular embodiment, the second semiconductor region and the buried semiconductor region deplete the first semiconductor region in response to a reverse bias potential applied across the semiconductor component.
1. A method of manufacturing a semiconductor component comprising:
providing a composite substrate comprising a semiconductor epitaxial layer above a semiconductor substrate, the composite substrate having a first conductivity type;
forming a buried semiconductor region in the epitaxial layer, having the second conductivity type;
forming a first semiconductor region in the epitaxial layer, having the first conductivity type and located above the buried semiconductor region;
forming a second semiconductor region in the epitaxial layer having the second conductivity type and located above at least a portion of the first semiconductor region;
disposing a sinker region having the second conductivity above the buried semiconductor region;
disposing an emitter having the second conductivity type in the second semiconductor region, wherein the sinker region electrically ties the buried semiconductor region and the emitter via the second semiconductor region; and
disposing a collector having the second conductivity type in the first semiconductor region,
wherein the second semiconductor region and the buried semiconductor region deplete the first semiconductor region in response to a reverse bias potential applied across the semiconductor component.
2. A method of manufacturing a semiconductor component as claimed in claim 1 wherein the first conductivity type is P-type and the second conductivity type is N-type.
3. A method of manufacturing a semiconductor component as claimed in claim 1 wherein the step of disposing a sinker region above the buried semiconductor region includes disposing the sinker region in the first semiconductor region and the second semiconductor region.
4. A method of manufacturing a semiconductor component as claimed in claim 1 wherein the second semiconductor region and the first semiconductor region form an active area of an IGBT.
5. A method of manufacturing a semiconductor component as claimed in claim 1 wherein the buried semiconductor region is continuous under all of the active area of the IGBT.
6. A method of manufacturing a semiconductor component as claimed in claim 1 further including the step of disposing a buffer region in the first semiconductor region, the buffer region formed to enclose the collector and having the same conductivity type as the collector.