IP Library Granted Patent US 7,338,842
Granted Patent B2
US 7,338,842 · App. 11/168,236 · Granted Mar 4, 2008

Process for exposing solder bumps on an underfill coated semiconductor

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Quick Facts
Patent No.
US 7,338,842
App. No.
11/168,236
Granted
Mar 4, 2008
Kind
B2
Abstract

A process for applying a solvent-free underfill onto a bumped semiconductor comprises: providing an underfill in a compressible state on a semiconductor, contacting the underfill with a compliant surface and applying sufficient pressure to expose the bumps, optionally hardening the underfill to a solid state, and removing the compliant surface.

Claims (21)

1. A process for applying a solvent-free underfill onto a semiconductor having an array of solder bumps on a surface of the semiconductor, the process comprising:

i. providing an underfill in a compressible state on the semiconductor,

ii. contacting the underfill with a compliant surface and applying sufficient pressure to expose the solder bumps on the surface of the semiconductor,

iii. hardening the underfill to a solid state, and

iv. removing the compliant surface.

2. The process of claim 1 in which the underfill is provided by depositing it as a solid powder on the semiconductor and is converted to a compressible state by melting.

3. The process of claim 1 in which the underfill is deposited as a liquid onto the semiconductor.

4. The process of claim 1 in which the underfill is a curable epoxy resin.

5. The process of claim 1 in which the compliant surface is a silicone rubber.

6. The process of claim 1 in which the semiconductor is a silicon die.

7. The process of claim 1 in which the semiconductor is a silicon wafer.

8. A process for applying a solvent-free underfill onto a semiconductor having an array of solder bumps on a surface of the semiconductor, the process comprising:

v. providing an underfill in a compressible state on the semiconductor,

vi. contacting the underfill with a compliant surface and applying sufficient pressure to expose the solder bumps on the surface of the semiconductor,

vii. removing the compliant surface.

9. The process of claim 8 in which the underfill is provided by depositing it as a solid powder on the semiconductor and is converted to a compressible state by melting.

10. The process of claim 8 in which the underfill is deposited as a liquid onto the semiconductor.

11. The process of claim 8 in which the underfill is a curable epoxy resin.

12. The process of claim 8 in which the compliant surface is a silicone rubber.

13. The process of claim 8 in which the semiconductor is a silicon die.

14. The process of claim 8 in which the semiconductor is a silicon wafer.

Assignments (3)
CHANGE OF NAME Recorded Dec 3, 2008
From: HENKEL KGAA
To: HENKEL AG & CO. KGAA
Reel/Frame 022309/0718 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2008
From: NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION; INDOPCO, INC.
To: HENKEL KGAA
Reel/Frame 021912/0634 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2005
From: CHAWARE, RAGHUNANDAN; DOMINIC, CHRISTOPHER
To: NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION
Reel/Frame 016577/0406 →