Method for production of a standard cell arrangement, and apparatus for carrying out the method
View Patent ↗A standard cell arrangement can be produced by automatically determining a distance between at least two standard cells in at least one standard cell row. The method also automatically determines whether at least one of the determined distances is less than a predetermined minimum distance. If the distance is less than the minimum distance in at least one case, the width of at least one standard cell in the standard cell row in a virtual layout of standard cells is broadened in a predetermined manner. The broadened standard cell is automatically placed in the virtual layout with other standard cells. The placement of the broadened standard cell in the virtual layout is transferred to the real layout of the standard cells. In this manner, the standard cells are provided with the originally intended width again, in order to create greater distances between the standard cells in the real layout.
1. A method of producing a standard cell arrangement, the method comprising:
automatically determining a distance between at least two standard cells in at least one standard cell row;
automatically determining whether at least one of the determined distances is less than a predetermined minimum distance;
if the distance is less than the minimum distance in at least one case, broadening the width of at least one standard cell in the standard cell row in a virtual layout of standard cells in a predetermined manner;
automatically placing the at least one broadened standard cell in the virtual layout with other standard cells; and
transferring the placing of the at least one broadened standard cell in the virtual layout to a real layout of the standard cells, wherein the standard cells are provided with the originally intended width again in order to create greater distances between the standard cells in the real layout.
2. The method according to claim 1 , wherein the broadening of at least one standard cell in the virtual layout is carried out by an integer multiple of a predetermined grid width.
3. The method according to claim 2 , further comprising fabricating a semiconductor device based upon the real layout.
4. The method according to claim 3 , wherein the semiconductor device comprises a memory device.
5. The method according to claim 1 , further comprising fabricating a semiconductor device based upon the real layout.
6. The method according to claim 5 , wherein the semiconductor device comprises a memory device.
7. A method of producing a standard cell arrangement, the method comprising:
in a first method step, automatically determining a distance between at least two standard cells in at least one standard cell row;
in a second method step, automatically determining whether at least one of the determined distances is less than a predetermined minimum distance;
in a third method step, if the distance is less than the minimum distance in at least one case, broadening the width of at least one standard cell in the standard cell row in a virtual layout of standard cells in a predetermined manner, and automatically placing the at least one broadened standard cell in the virtual layout with other standard cells; and
in a fourth method step, transferring the placing of the broadened standard cells in the virtual layout to a real layout of the standard cells, wherein the standard cells are provided with the originally intended width again in order to create greater distances between the standard cells in the real layout;
wherein the first method step is performed before the second method step, the second method step is performed before the third method step, and the third method step is performed before the fourth method step.
8. The method according to claim 7 , wherein the broadening of at least one standard cell in the virtual layout is carried out by an integer multiple of a predetermined grid width.
9. The method according to claim 8 , further comprising fabricating a semiconductor device based upon the real layout.
10. The method according to claim 9 , wherein the semiconductor device comprises a memory device.
11. The method according to claim 7 , further comprising fabricating a semiconductor device based upon the real layout.
12. The method according to claim 11 , wherein the semiconductor device comprises a memory device.
13. An apparatus for producing a standard cell arrangement, the apparatus comprising:
means for automatically determining the distance between at least two standard cells;
comparison means for automatically determining whether at least one of the distances is less than a predetermined minimum distance;
modification means for broadening the width of at least one standard cell in a standard cell row in a virtual layout of standard cells in a predetermined manner if the distance is less than the minimum distance, wherein the at least one broadened standard cell is automatically placed in the virtual layout with other standard cells; and
placing means for placing the broadened standard cells and/or the non-broadened standard cells in the virtual layout into a real layout of the standard cells, wherein the standard cells are provided with the originally intended width again in order to create greater distances between the standard cells in the real layout.
14. The apparatus according to claim 13 , wherein the broadening of at least one standard cell in the virtual layout is carried out by an integer multiple of a predetermined grid width.