Embedded substrate interconnect for underside contact to source and drain regions
View Patent ↗A semiconductor topography ( 10 ) is provided which includes a semiconductor-on-insulator (SOI) substrate having a conductive line ( 16 ) arranged within an insulating layer ( 22 ) of the SOI substrate. A method for forming an SOI substrate with such a configuration includes forming a first conductive line ( 16 ) within an insulating layer ( 22 ) arranged above a wafer substrate ( 12 ) and forming a silicon layer ( 24 ) upon surfaces of the first conductive line and the insulating layer. A further method is provided which includes the formation of a transistor gate ( 28 ) upon an SOI substrate having a conductive line ( 16 ) embedded therein and implanting dopants within the semiconductor topography to form source and drain regions ( 30 ) within an upper semiconductor layer ( 24 ) of the SOI substrate such that an underside of one of the source and drain regions is in contact with the conductive line.
1. A method for processing a semiconductor topography, comprising:
forming a transistor gate over a semiconductor-on-insulator (SOI) substrate; and
implanting dopants within an upper semiconductor layer of the SOI substrate to form source and drain regions such that an underside of the source region or the drain region is in electrical contact with a conductive line arranged within an insulating layer of the SOI substrate,
wherein the step of forming the transistor gate comprises patterning a portion of the transistor gate over a portion of an isolation region arranged above a portion of the conductive line.
2. The method of claim 1 , wherein the step of implanting the dopants comprises implanting the dopants such that an underside of the other of the source and drain regions is in contact with a different conductive line arranged within an insulating layer of the SOI substrate.
3. The method of claim 1 , wherein the step of forming the transistor gate comprises aligning a lithography tool used to pattern the transistor gate relative to a position of the conductive line.
4. The method of claim 1 , further comprising:
depositing a dielectric layer over the transistor gate and over the source and drain regions; and
retaining at least a portion of the dielectric layer over an entirety of the source and drain regions while forming an interconnect line over the dielectric layer.
5. A method for processing a semiconductor topography, comprising:
forming a first conductive line and an insulating layer above a wafer substrate such that the first conductive line is within the insulating layer;
forming a semiconductor layer upon surfaces of the first conductive line and the insulating layer;
forming a transistor gate over the semiconductor layer such that a portion of the transistor gate overlies a portion of an isolation region arranged over the wafer substrate and over a portion of the first conductive line; and
implanting dopants within the semiconductor layer to form source and drain regions within the semiconductor layer, wherein the source region or the drain region is electrically coupled to the first conductive line.
6. The method of claim 5 , wherein the step forming the semiconductor layer comprises bonding a semiconductor wafer to the surfaces of the first conductive line and the insulating layer.
7. The method of claim 5 , wherein the step of forming the first conductive line and the insulating layer comprises:
forming a first insulating sub-layer upon a wafer substrate;
forming the first conductive line upon the first insulating sub-layer;
forming a second insulating sub-layer upon the first conductive line and adjacent portions of the first insulating sub-layer; and
polishing the second insulating sub-layer to expose the first conductive line.
8. The method of claim 5 , wherein the step of forming the first conductive line and the insulating layer comprises forming the first conductive line, the insulating layer, and a second conductive line above the wafer substrate such that the first and second conductive lines are within the insulating layer.
9. The method of claim 1 , further comprising:
forming active regions from portions of the upper semiconductor layer, wherein the active regions are spaced apart from each other;
forming a field isolation region that surrounds the active regions, wherein a portion of the field isolation region overlies the conductive line; and
forming a contact structure to the conductive line, wherein the contact structure extends through the field isolation region and is spaced apart from the active regions.
10. The method of claim 5 , further comprising:
forming active regions from portions of the semiconductor layer, wherein the active regions are spaced apart from each other;
forming a field isolation region that surrounds the active regions, wherein a portion of the field isolation region overlies the first conductive line; and
forming a contact structure to the first conductive line, wherein the contact structure extends through the field isolation region and is spaced apart from the active regions.
11. A method of forming an integrated circuit comprising:
forming a conductive line and an insulating layer over a substrate, wherein the insulating layer surrounds the conductive line;
forming active regions over portions of the insulating layer, wherein the active regions are spaced apart from each other and the substrate, and wherein the active regions includes a first active region;
forming a field isolation region that surrounds the active regions, wherein a portion of the field isolation region overlies the conductive line;
forming a transistor gate over the first active region;
implanting a dopant within the first active region to form source and drain regions such that an underside of the source region or the drain region is in electrical contact with the conductive line; and
forming a contact structure to the conductive line, wherein the contact structure extends through the field isolation region and is spaced apart from the active regions.
12. The method of claim 11 , wherein the step of implanting the dopant comprises implanting the dopant such that an underside of the other of the source and drain regions is in contact with a different conductive line within the insulating layer.
13. The method of claim 11 , wherein the step of forming the transistor gate comprises aligning a lithography tool used to pattern the transistor gate relative to a position of the conductive line.
14. The method of claim 11 , wherein the step of forming the transistor gate comprises patterning a portion of the transistor gate over a portion of the field isolation region.
15. The method of claim 11 , further comprising:
depositing a dielectric layer over the transistor gate and the source and drain regions; and
retaining at least a portion of the dielectric layer over an entirety of the source and drain regions while forming an interconnect line upon an upper surface of the dielectric layer.
16. A method of forming an integrated circuit comprising:
forming a first conductive line and an insulating layer over a substrate, wherein the insulating layer surrounds the first conductive line;
forming a semiconductor layer upon surfaces of the first conductive line and the insulating layer;
patterning the semiconductor layer to form semiconductor regions that are space apart from each other and the substrate, wherein the semiconductor regions includes a first semiconductor region;
forming a field isolation region that surrounds the semiconductor regions, wherein a portion of the field isolation region overlies the first conductive line;
implanting a dopant within the first semiconductor region to form a doped region such that the doped region is in electrical contact with the first conductive line; and
forming a contact structure to the conductive line, wherein the contact structure extends though the field isolation region and is spaced apart from the semiconductor regions.
17. The method of claim 16 , wherein the step of forming the first conductive line and the insulating layer comprises:
forming a first insulating sub-layer over the substrate;
forming the first conductive line upon the first insulating sub-layer;
forming a second insulating sub-layer upon the first conductive line and adjacent portions of the first insulating sub-layer; and
polishing the second insulating sub-layer to expose the first conductive line.
18. The method of claim 16 , wherein the step of forming the first conductive line and the insulating layer comprises forming the first conductive line, the insulating layer, and a second conductive line above the substrate such that the first and second conductive lines are within the insulating layer.
19. The method of claim 16 , further comprising:
forming a transistor gate over the first semiconductor region; and
implanting a dopant within the first semiconductor region comprises forming source and drain regions, wherein the source region or the drain region is electrically coupled to the first conductive line.
20. The method of claim 18 , wherein the step of forming the transistor gate comprises patterning a portion of the transistor gate over a portion of the field isolation region and over a portion of the first conductive line.